ION-BEAM SHADOW PRINTING THROUGH THIN SILICON FOILS USING CHANNELING

[1] CHU WK, 1978, BACKSCATTERING SPECT, P225

[2] DELSARTE D, 1971, ATOMIC COLLISION PHE, P501

[3] Eisen F.H., 1972, RADIAT EFF, V13, P93, DOI [10.1080/00337577208231165, DOI 10.1080/00337577208231165]

[4] FELDMANN LC, 1977, ION BEAM HDB MATERIA, P144

[5] POLYIMIDE MEMBRANE X-RAY LITHOGRAPHY MASKS - FABRICATION AND DISTORTION MEASUREMENTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 995 - 997

[6] SUPER-CHANNELING OF ACCELERATED IONS THROUGH CRYSTALS WITH LARGE CHANNELS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (09) : 4956 - 4957

[7] ION-BEAM EXPOSURE OF RESIST MATERIALS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) : 483 - 490

[8] MCCOY J, 1974, ELECTRON ION BEAM SC, P3

[9] MEEK RL, 1971, RADIAT EFF, V11, P139

[10] ION-BEAM LITHOGRAPHY FOR IC-FABRICATION WITH SUBMICROMETER FEATURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1897 - 1900

[1] CHU WK, 1978, BACKSCATTERING SPECT, P225

[2] DELSARTE D, 1971, ATOMIC COLLISION PHE, P501

[3] Eisen F.H., 1972, RADIAT EFF, V13, P93, DOI [10.1080/00337577208231165, DOI 10.1080/00337577208231165]

[4] FELDMANN LC, 1977, ION BEAM HDB MATERIA, P144

[5] POLYIMIDE MEMBRANE X-RAY LITHOGRAPHY MASKS - FABRICATION AND DISTORTION MEASUREMENTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 995 - 997

[6] SUPER-CHANNELING OF ACCELERATED IONS THROUGH CRYSTALS WITH LARGE CHANNELS [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (09) : 4956 - 4957

[7] ION-BEAM EXPOSURE OF RESIST MATERIALS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) : 483 - 490

[8] MCCOY J, 1974, ELECTRON ION BEAM SC, P3

[9] MEEK RL, 1971, RADIAT EFF, V11, P139

[10] ION-BEAM LITHOGRAPHY FOR IC-FABRICATION WITH SUBMICROMETER FEATURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1897 - 1900