POLYIMIDE MEMBRANE X-RAY LITHOGRAPHY MASKS - FABRICATION AND DISTORTION MEASUREMENTS

被引：31

作者：

FLANDERS, DC

SMITH, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期

关键词：

D O I：

10.1116/1.569694

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：995 / 997

页数：3

共 11 条

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[5] FLANDERS DC, 1976, SOLID STATE RES REPO, P51
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1324 - 1324
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[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 434 - 439
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[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 429 - 433
[9] APPLICATION OF MOIRE TECHNIQUES IN SCANNING ELECTRON-BEAM LITHOGRAPHY AND MICROSCOPY
SMITH, HI
CHINN, SR
DEGRAFF, PD
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1262 - 1265
[10] SPEARS DL, 1972, SOLID STATE TECHNOL, V15, P21