X-RAY LITHOGRAPHY .1. DESIGN CRITERIA FOR OPTIMIZING RESIST ENERGY-ABSORPTION .2. PATTERN REPLICATION WITH POLYMER MASKS

被引:21
作者
GREENEICH, JS [1 ]
机构
[1] GEN MOTORS RES LABS,DEPT ELECTR,WARREN,MI 48000
关键词
D O I
10.1109/T-ED.1975.18157
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:434 / 439
页数:6
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