SOLUBILITY RATE OF POLY-(METHYL METHACRYLATE), PMMA, ELECTRON-RESIST

被引：44

作者：

GREENEICH, JS ^{[1
]}

机构：

[1] GM CORP, TECH CTR, ELECTR DEPT, RES LABS, WARREN, MI 48090 USA

来源：

关键词：

D O I：

10.1149/1.2401767

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1669 / 1671

页数：3

共 7 条

[1] DETERMINATION OF KILOVOLT ELECTRON ENERGY DISSIPATION VS PENETRATION DISTANCE IN SOLID MATERIALS
EVERHART, TE
HOFF, PH
[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5837 - &
[2] MODEL FOR EXPOSURE OF ELECTRON-SENSITIVE RESISTS
GREENEICH, JS
VANDUZER, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1056 - 1059
[3] GREENEICH JS, 1973, THESIS U CALIFORNIA
[4] GREENEICH JS, TO BE PUBLISHED
[5] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION
HATZAKIS, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &
[6] HATZAKIS M, 1969, 10 S EL ION LAS BEAM, P107
[7] TING C, 1971, 11TH S EL ION LAS BE, P337