MODEL FOR EXPOSURE OF ELECTRON-SENSITIVE RESISTS

被引：36

作者：

GREENEICH, JS

VANDUZER, T

机构：

[1] UNIV CALIF, DEPT ELECT ENGN & COMP SCI, BERKELEY, CA 94720 USA

[2] UNIV CALIF, ELECTR RES LAB, BERKELEY, CA 94720 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.1318466

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1056 / 1059

页数：4

相关论文

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