PREPARATION STRUCTURE AND PROPERTIES OF SPUTTERED HIGHLY NITRIDED TANTALUM FILMS

被引：35

作者：

COYNE, HJ

TAUBER, RN

机构：

来源：

关键词：

D O I：

10.1063/1.1656019

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5585 / +

页数：1

共 22 条

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