EXPONENTIAL PROJECTILE CHARGE DEPENDENCE OF AR-K AND NEK-X-RAY PRODUCTION BY FAST, HIGHLY IONIZED ARGON BEAMS IN THIN NEON TARGETS

被引:39
作者
MOWAT, JR
SELLIN, IA
PEGG, DJ
PETERSON, RS
BROWN, MD
MACDONALD, JR
机构
[1] UNIV TENNESSEE, KNOXVILLE, TN 37916 USA
[2] KANSAS STATE UNIV, MANHATTAN, KS 66506 USA
[3] OAK RIDGE NATL LAB, OAK RIDGE, TN 37830 USA
关键词
D O I
10.1103/PhysRevLett.30.1289
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:1289 / 1292
页数:4
相关论文
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[11]   PROJECTILE STRUCTURE EFFECTS ON NEON K X-RAY PRODUCTION BY FAST, HIGHLY IONIZED ARGON BEAMS [J].
MOWAT, JR ;
GRIFFIN, PM ;
SELLIN, IA ;
PETERSON, RS ;
PEGG, DJ .
PHYSICAL REVIEW LETTERS, 1972, 29 (24) :1577-&