EPITAXIAL-GROWTH AND DIELECTRIC-PROPERTIES OF (BA0.24SR0.76)TIO3 THIN-FILM

被引:41
作者
ABE, K
KOMATSU, S
机构
[1] Materials and Devices Research Laboratories, R k D Center, Toshiba Corporation, Komukai-toshiba-cho, aiwai-ku, Kawasaki
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 9B期
关键词
(BAXSR1-X)TIO3; THIN FILM; SPUTTERING; EPITAXIAL GROWTH; DIELECTRIC CONSTANT; BIAS FIELD; POLARIZATION SATURATION; ELECTRODE; LOCAL FIELD;
D O I
10.1143/JJAP.33.5297
中图分类号
O59 [应用物理学];
学科分类号
摘要
A (Ba0.24ST0.76)TiO3 thin film was epitaxially grown on a Pt/MgO(100) substrate by rf magnetron sputtering, and its dielectric properties were evaluated. The thin film had a dielectric constant of 1400 at zero bias field. A drastic decrease of dielectric constant was observed when bias field was applied. Based on the experimental results on the epitaxial film, size effects reported in the dielectric constant of (BaxSr1-x)TiO3 polycrystalline thin films were discussed. Both the sensitive bias field dependence of the dielectric constant and the existence of strong local fields are probably the origin of the size effects observed in (BaxSr1-x)TiO3 thin films.
引用
收藏
页码:5297 / 5300
页数:4
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