PHONON DISPERSION IN INTERMEDIATE-VALENCE SM0.75Y0.25S

被引：120

作者：

MOOK, HA ^{[1
]}

NICKLOW, RM ^{[1
]}

PENNEY, T ^{[1
]}

HOLTZBERG, F ^{[1
]}

SHAFER, MW ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW B | 1978年 / 18卷 / 06期

关键词：

D O I：

10.1103/PhysRevB.18.2925

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2925 / 2928

页数：4

共 26 条

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