PREPARATION OF TE FILMS BY HOT WALL EPITAXY

被引:12
作者
ATHWAL, IS
BEDI, RK
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1987年 / 26卷 / 09期
关键词
D O I
10.1143/JJAP.26.1413
中图分类号
O59 [应用物理学];
学科分类号
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页码:1413 / 1415
页数:3
相关论文
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