CROSSLINKED POLY(2,2,2-TRICHLOROETHYL METHACRYLATE) AS A HIGHLY SENSITIVE POSITIVE ELECTRON RESIST

被引：34

作者：

TADA, T

机构：

[1] VLSI Technology Research Association, Cooperative Laboratories, Kawasaki

来源：

关键词：

electron beam; integrated circuits; positive resist;

D O I：

10.1149/1.2129347

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：1635 / 1636

页数：2

共 7 条

[1]

GROBMAN WD, 1978, IEDM WASHINGTON, P58

[2]

KITAKOJI T, 1978, 154TH ECS M, V78, P472

[3]

ROBERTS ED, 1974, APPL POLYM S, V23, P87

SPRAGUE, ED ;

WILLIAMS, F .

[5]

SUMI M, 1978, 10TH P C SOL STAT DE, P303

[6] SENSITIVE CHLORINE-CONTAINING RESISTS FOR X-RAY LITHOGRAPHY [J].

TAYLOR, GN ;

COQUIN, GA ;

SOMEKH, S .

YU, HN ;

DENNARD, RH ;

CHANG, THP ;

OSBURN, CM ;

DILONARDO, V ;

LUHN, HE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1297-1300