FABRICATION OF A MINIATURE 8K-BIT MEMORY CHIP USING ELECTRON-BEAM EXPOSURE

被引：54

作者：

YU, HN ^{[1
]}

DENNARD, RH ^{[1
]}

CHANG, THP ^{[1
]}

OSBURN, CM ^{[1
]}

DILONARDO, V ^{[1
]}

LUHN, HE ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568521

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1297 / 1300

页数：4

共 13 条

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[J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1975, SC10 (02) : 92 - 97
[9] HOFFMAN WK, 1973, 64 ISSCC DIG TECH PA
[10] PANKYATZ JM, 1973, DEC IEEE INT EL DEV, P44