STRUCTURE CONTROL OF GAN FILMS GROWN ON (001) GAAS SUBSTRATES BY GAAS SURFACE PRETREATMENTS

被引:79
作者
FUJIEDA, S [1 ]
MATSUMOTO, Y [1 ]
机构
[1] NEC CORP LTD, FUNDAMENTAL RES LABS, TSUKUBA, IBARAKI 305, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 9B期
关键词
GALLIUM NITRIDE; GALLIUM ARSENIDE; SURFACE NITRIDATION; CRYSTAL STRUCTURE;
D O I
10.1143/JJAP.30.L1665
中图分类号
O59 [应用物理学];
学科分类号
摘要
Two types of cubic and hexagonal GaN films were deposited on (001) GaAs substrates. The film structure proved to be controlled by GaAs pretreatments. By performing a N2H4 (hydrazine) pretreatment of GaAs substrates, the GaN films, which were otherwise hexagonal similarly to ordinary films on sapphire substrates, became cubic. A surface cubic nitride layer was found to be formed on the pretreated GaAs by a RHEED (reflection high-energy electron diffraction) observation, which is thought to be the substantial substrate for the following growth of a cubic GaN film.
引用
收藏
页码:L1665 / L1667
页数:3
相关论文
共 9 条
  • [1] INTERFACIAL SUPERSTRUCTURE OF AIN/N-GAAS(001) SYSTEM FABRICATED BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    AKIMOTO, K
    HIROSAWA, I
    MIZUKI, J
    FUJIEDA, S
    MATSUMOTO, Y
    MATSUI, J
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (08): : L1401 - L1403
  • [2] FORMATION OF ALUMINUM NITRIDE FILMS ON GAAS(110) AT ROOM-TEMPERATURE BY REACTIVE MOLECULAR-BEAM EPITAXY - X-RAY AND SOFT-X-RAY PHOTOEMISSION SPECTROSCOPY
    BAIER, HU
    MONCH, W
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (02) : 586 - 590
  • [3] REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND X-RAY STUDIES OF A1N FILMS GROWN ON SI(111) AND SI(001) BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    CHUBACHI, Y
    SATO, K
    KOJIMA, K
    [J]. THIN SOLID FILMS, 1984, 122 (03) : 259 - 270
  • [4] CONTROL OF THE ELECTRICAL-PROPERTIES OF ALN/THIN-A-SI/GAAS MIS DIODES BY GAAS SURFACE PRETREATMENTS
    FUJIEDA, S
    MOCHIZUKI, Y
    AKIMOTO, K
    HIROSAWA, I
    MATSUMOTO, Y
    MATSUI, J
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (02): : L364 - L367
  • [5] IMPROVEMENT OF THE ELECTRICAL-PROPERTIES OF THE AIN GAAS MIS SYSTEM AND THEIR THERMAL-STABILITY BY GAAS SURFACE STOICHIOMETRY CONTROL
    FUJIEDA, S
    MIZUTA, M
    MATSUMOTO, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (03): : L296 - L299
  • [6] GROWTH-CHARACTERIZATION OF LOW-TEMPERATURE MOCVD GAN - COMPARISON BETWEEN N2H4 AND NH3
    FUJIEDA, S
    MIZUTA, M
    MATSUMOTO, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (12): : 2067 - 2071
  • [7] FUJIEDA S, 1989, SOLID STATE ELECTR S, V33, P233
  • [8] LOW-TEMPERATURE GROWTH OF GAN AND ALN ON GAAS UTILIZING METALORGANICS AND HYDRAZINE
    MIZUTA, M
    FUJIEDA, S
    MATSUMOTO, Y
    KAWAMURA, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (12): : L945 - L948
  • [9] NITRIDE LAYERS ON GAAS(110) SURFACES
    TROOST, D
    BAIER, HU
    BERGER, A
    MONCH, W
    [J]. SURFACE SCIENCE, 1991, 242 (1-3) : 324 - 330