APPLICATION OF PULSED CURRENT ELECTROLYSIS TO A ROTATING-DISK ELECTRODE SYSTEM .1. MASS-TRANSFER

被引：47

作者：

VISWANATHAN, K

EPSTEIN, MAF

CHEH, HY

机构：

来源：

关键词：

D O I：

10.1149/1.2131292

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1772 / 1776

页数：5

共 18 条

[1] ANDRICACOS PC, 1977, PLAT SURF FINISH, V64, P44
[2] BEDROSSIAN AA, 1976, OCT EL SOC EXT ABSTR, P136
[3] Cheh H. Y., 1977, Plating and Surface Finishing, V64, P42
[4] Cheh H. Y., 1977, Plating and Surface Finishing, V64, P66
[5] ELECTRODEPOSITION OF GOLD BY PULSED CURRENT
CHEH, HY
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) : 551 - &
[6] LIMITING RATE OF DEPOSITION BY P-R PLATING
CHEH, HY
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (07) : 1132 - &
[7] Chen E. S., 1976, Plating and Surface Finishing, V63, P28
[8] IBL N, UNPUBLISHED
[9] LEVICH VG, 1962, PHYSICOCHEMICAL HYDR
[10] Pleskov Y.V., 1976, ROTATING DISK ELECTR