MEASUREMENT OF THE INTERLAYER BETWEEN ALUMINUM AND SILICON DIOXIDE USING ELLIPSOMETRIC, CAPACITANCE-VOLTAGE AND AUGER-ELECTRON SPECTROSCOPY TECHNIQUES

被引：6

作者：

CANDELA, GA ^{[1
]}

GALLOWAY, KF ^{[1
]}

LIU, YM ^{[1
]}

FINE, J ^{[1
]}

机构：

[1] NBS,DIV SURFACE SCI,WASHINGTON,DC 20234

来源：

关键词：

D O I：

10.1016/0040-6090(81)90442-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：183 / 193

页数：11

共 28 条

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[8] VISUAL ION-BEAM IMAGES PRODUCED BY ELECTRON AND ION-BEAM INTERACTION ON SURFACES
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[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (03) : 1236 - 1240
[9] GRIMSHAW JA, 1979, 2ND P EUR COMM PHOT, P197
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