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ELECTROCHEMICAL DOPING OF SILICON WITH ARSENIC - REPLY
被引:4
作者
:
ANTULA, J
论文数:
0
引用数:
0
h-index:
0
机构:
8 München 12
ANTULA, J
机构
:
[1]
8 München 12
来源
:
JOURNAL OF APPLIED PHYSICS
|
1979年
/ 50卷
/ 06期
关键词
:
D O I
:
10.1063/1.326443
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
The explanation proposed by Northorp cannot be correct.
引用
收藏
页码:4460 / 4460
页数:1
相关论文
共 2 条
[1]
METHOD FOR DOPING THIN INSULATING FILMS AND COMPARISON BETWEEN ELECTRICAL CHARACTERISTICS OF UNDOPED AND DOPED FILMS
ANTULA, J
论文数:
0
引用数:
0
h-index:
0
ANTULA, J
[J].
JOURNAL OF APPLIED PHYSICS,
1971,
42
(05)
: 2081
-
&
[2]
ANTULA J, UNPUBLISHED
←
1
→
共 2 条
[1]
METHOD FOR DOPING THIN INSULATING FILMS AND COMPARISON BETWEEN ELECTRICAL CHARACTERISTICS OF UNDOPED AND DOPED FILMS
ANTULA, J
论文数:
0
引用数:
0
h-index:
0
ANTULA, J
[J].
JOURNAL OF APPLIED PHYSICS,
1971,
42
(05)
: 2081
-
&
[2]
ANTULA J, UNPUBLISHED
←
1
→