SOME EFFECTS OF STRAIN AND TEMPERATURE ON RESISTANCE OF OXYGEN ION IMPLANTED TITANIUM THIN-FILMS

被引：12

作者：

STROUD, PT

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(72)90188-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：205 / &

共 11 条

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STROUD, PT
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[3] KAYE GWC, TABLES PHYSICAL CHEM
[4] EFFECT OF STRUCTURE ON PIEZORESISTIVE PROPERTIES OF THIN METAL FILMS
KNIGHT, MJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04): : 706 - &
[5] NITONTOFF N, 1953, COMPT REND, V236, P2486
[6] NITONTOFF N, 1953, COMPT REND, V237, P24
[7] NITONTOFF N, 1953, COMPT REND, V236, P1538
[8] OCONNELL PA, 1970, COLLOQUIUM ION IMPLA
[9] ELECTRICAL RESISTANCE-STRAIN CHARACTERISTICS OF THIN EVAPORATED METAL FILMS
PARKER, RL
KRINSKY, A
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (09) : 2700 - &
[10] CONDUCTION IN METAL-OXIDE THIN-FILMS FORMED BY OXYGEN ION IMPLANTATION
PERKINS, JG
[J]. THIN SOLID FILMS, 1972, 9 (02) : 257 - &