THE SPUTTERING YIELD OF POLYCRYSTALLINE MATERIALS

被引：10

作者：

TORTORELLI, PF

ALTSTETTER, CJ

机构：

[1] UNIV ILLINOIS,DEPT MET,URBANA,IL 61801

[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1980年 / 51卷 / 3-4期

关键词：

D O I：

10.1080/00337578008210006

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：241 / 248

页数：8

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[2]

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[3]

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[6]

Roosendaal HE, 1972, RADIAT EFF, V14, P93

[7] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J].

SIGMUND, P .

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[8] MICROTOPOGRAPHY OF SURFACES ERODED BY ION-BOMBARDMENT [J].

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THOMPSON, MW .

JOURNAL OF MATERIALS SCIENCE, 1969, 4 (01) :56-&

[9]

TORTORELLI PF, 1978, THESIS U ILLINOIS

[10] SPUTTERING YIELDS FOR NORMALLY INCIDENT HG+-ION BOMBARDMENT AT LOW ION ENERGY [J].

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PHYSICAL REVIEW, 1957, 108 (01) :35-45

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