FORMATION OF SILICON AND TITANIUM CARBIDES BY CHEMICAL VAPOR DEPOSITION

[1] ELYUTIN VP, 1964, IZV VYSSHIKH UCHEBN, V7, P124

[2] ELYUTIN VP, 1963, IZV VYSSHIKH UCHEBN, V6, P5

[3] ELECTRONIC CONDUCTION IN SILICON CARBIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1953, 21 (05) : 821 - 827

[4] KENDALL JT, 1947, P 11 INT C PUR APPL, V1, P171

[5] KUBASCHEWSKI O, 1958, METALLURGICAL THERMO, V1

[6] MAREK RW, 1967, ELECTROCHEM TECHNOL, V5, P185

[7] MCQUILLAN AD, 1956, TITANIUM

[8] MEYERSON GA, 1964, RUSS MET MINING, P31

[9] OCONNOR JR, 1959, APR P C SIL CARB ED

[10] VAPOUR PRESSURE OF TITANIUM TETRACHLORIDE [J]. JOURNAL OF INORGANIC & NUCLEAR CHEMISTRY, 1965, 27 (08): : 1876 - &

[1] ELYUTIN VP, 1964, IZV VYSSHIKH UCHEBN, V7, P124

[2] ELYUTIN VP, 1963, IZV VYSSHIKH UCHEBN, V6, P5

[3] ELECTRONIC CONDUCTION IN SILICON CARBIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1953, 21 (05) : 821 - 827

[4] KENDALL JT, 1947, P 11 INT C PUR APPL, V1, P171

[5] KUBASCHEWSKI O, 1958, METALLURGICAL THERMO, V1

[6] MAREK RW, 1967, ELECTROCHEM TECHNOL, V5, P185

[7] MCQUILLAN AD, 1956, TITANIUM

[8] MEYERSON GA, 1964, RUSS MET MINING, P31

[9] OCONNOR JR, 1959, APR P C SIL CARB ED

[10] VAPOUR PRESSURE OF TITANIUM TETRACHLORIDE [J]. JOURNAL OF INORGANIC & NUCLEAR CHEMISTRY, 1965, 27 (08): : 1876 - &