CONCENTRATION PROFILES OF NICKEL AND CHROMIUM IMPLANTED IN MILD-STEEL

被引:4
作者
IWAKI, M
NAMBA, S
YOSHIDA, K
SODA, N
YUKAWA, KI
SATO, T
机构
[1] INST PHYS & CHEM RES,SAITAMA 351,JAPAN
[2] NIPPON STEEL CORP,FUNDAMENT RES LABS,KAWASAKI,KANAGAWA 211,JAPAN
[3] NIPPON STEEL CORP,CHIYODA,TOKYO 100,JAPAN
关键词
D O I
10.1143/JJAP.16.1475
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1475 / 1476
页数:2
相关论文
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[Anonymous], 1963, KGL DANSKE VIDENSKAB
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GAMO, K ;
MASUDA, K ;
NAMBA, S .
APPLIED PHYSICS LETTERS, 1970, 17 (09) :391-+
[3]  
PICRAUX ST, 1973, APPLICATIONS ION BEA
[4]  
TAMURA H, 1974, JPN J APPL PHYS, P379