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ACOUSTIC-EMISSION STUDY OF DEFECTS IN GALLIUM-PHOSPHIDE LIGHT-EMITTING DIODES
被引:4
作者
:
IKOMA, T
论文数:
0
引用数:
0
h-index:
0
机构:
Institute of Industrial Science, University of Tokyo, Tokyo, 106, 22-1, Roppongi 7 Chome, Minato-ku
IKOMA, T
OGURA, M
论文数:
0
引用数:
0
h-index:
0
机构:
Institute of Industrial Science, University of Tokyo, Tokyo, 106, 22-1, Roppongi 7 Chome, Minato-ku
OGURA, M
ADACHI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Institute of Industrial Science, University of Tokyo, Tokyo, 106, 22-1, Roppongi 7 Chome, Minato-ku
ADACHI, Y
机构
:
[1]
Institute of Industrial Science, University of Tokyo, Tokyo, 106, 22-1, Roppongi 7 Chome, Minato-ku
来源
:
JOURNAL OF ELECTRONIC MATERIALS
|
1979年
/ 8卷
/ 04期
关键词
:
acoustic emission;
degradation;
dislocation;
LED;
D O I
:
10.1007/BF02652404
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
Acoustic emission was observed from GaP:N light emitting diodes during stress operation and correlated with the degradation of light output. Acoustic emission was found to be due to the generation of dislocations which were revealed by etch pits after degradation. Acoustic signals were detected with a PZT transducer directly placed under the diode chip. Two components of acoustic signals were recorded, i.e., sharp pulses and a CW component. The light output decreased in proportion to the logarithm of time for a certain period after which the light output degraded irregularly. In the logarithmic decay period no acoustic emission was observed and the etch pit density did not increase.- The irregular degradation was always accompanied by acoustic emission and the etch pit density increased remarkably. Luminescence spectra and effective carrier concentration profiles were also compared before and after degradation. It is shown that the acoustic emission monitoring provides a novel technique to reliability physics of compound semiconductors. © 1979 AIME.
引用
收藏
页码:529 / 543
页数:15
相关论文
共 5 条
[1]
IKOMA T, 1976, 3RD P AC EM S TOK, P329
[2]
ONOE M, 1968, NOV P NAT C AC SOC J
[3]
DEFECT STRUCTURE INTRODUCED DURING OPERATION OF HETEROJUNCTION GAAS LASERS
[J].
PETROFF, P
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PETROFF, P
;
HARTMAN, RL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
HARTMAN, RL
.
APPLIED PHYSICS LETTERS,
1973,
23
(08)
:469
-471
[4]
CONTROLLED CHEMICAL ETCHING OF GAP
[J].
PLAUGER, LR
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PLAUGER, LR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(03)
:455
-457
[5]
ETCH PITS IN GALLIUM ARSENIDE
[J].
RICHARDS, JL
论文数:
0
引用数:
0
h-index:
0
RICHARDS, JL
;
CROCKER, AJ
论文数:
0
引用数:
0
h-index:
0
CROCKER, AJ
.
JOURNAL OF APPLIED PHYSICS,
1960,
31
(03)
:611
-612
←
1
→
共 5 条
[1]
IKOMA T, 1976, 3RD P AC EM S TOK, P329
[2]
ONOE M, 1968, NOV P NAT C AC SOC J
[3]
DEFECT STRUCTURE INTRODUCED DURING OPERATION OF HETEROJUNCTION GAAS LASERS
[J].
PETROFF, P
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PETROFF, P
;
HARTMAN, RL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
HARTMAN, RL
.
APPLIED PHYSICS LETTERS,
1973,
23
(08)
:469
-471
[4]
CONTROLLED CHEMICAL ETCHING OF GAP
[J].
PLAUGER, LR
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PLAUGER, LR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(03)
:455
-457
[5]
ETCH PITS IN GALLIUM ARSENIDE
[J].
RICHARDS, JL
论文数:
0
引用数:
0
h-index:
0
RICHARDS, JL
;
CROCKER, AJ
论文数:
0
引用数:
0
h-index:
0
CROCKER, AJ
.
JOURNAL OF APPLIED PHYSICS,
1960,
31
(03)
:611
-612
←
1
→