DEPTH PROFILING OF IMPLANTED NEON WITH RESONANT NUCLEAR-REACTIONS

被引：11

作者：

SWITKOWSKI, ZE

OVERLEY, JC

WU, SC

BARNES, CA

ROTH, J

机构：

[1] CALTECH,KELLOGG RADIAT LAB,PASADENA,CA 91125

[2] CALTECH,HG STEEL ELECT ENGN LAB,PASADENA,CA 91125

来源：

JOURNAL OF NUCLEAR MATERIALS | 1978年 / 78卷 / 01期

关键词：

D O I：

10.1016/0022-3115(78)90505-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：64 / 76

页数：13

共 30 条

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