INSITU X-RAY ABSORPTION STUDY OF CHROMIUM VALENCY CHANGES IN PASSIVE OXIDES ON SPUTTERED ALCR THIN-FILMS UNDER ELECTROCHEMICAL CONTROL

被引：30

作者：

DAVENPORT, AJ ^{[1
]}

ISAACS, HS ^{[1
]}

FRANKEL, GS ^{[1
]}

SCHROTT, AG ^{[1
]}

JAHNES, CV ^{[1
]}

RUSSAK, MA ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1149/1.2085572

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：337 / 338

页数：2

共 6 条

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[J]. SURFACE AND INTERFACE ANALYSIS, 1988, 12 (1-12) : 380 - 384
[2] A 13-ELEMENT GE DETECTOR FOR FLUORESCENCE EXAFS
CRAMER, SP
TENCH, O
YOCUM, M
GEORGE, GN
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1988, 266 (1-3) : 586 - 591
[3] FRANKEL GS, 1990, EXTENDED ABSTRACTS, V901
[4] HOFFMAN RW, 1983, PASSIVITY METALS SEM, P14
[5] KERKAR M, 1990, IN PRESS FARADAY DIS, V89
[6] Long G. G., 1983, Passivity of Metals and Semiconductors. Proceedings of the 5th International Symposium, P139