NANOSTRUCTURE FABRICATION VIA DIRECT WRITING WITH ATOMS FOCUSED IN LASER FIELDS
被引:20
作者:
SCHOLTEN, RE
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SCHOLTEN, RE
MCCLELLAND, JJ
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MCCLELLAND, JJ
PALM, EC
论文数: 0引用数: 0
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PALM, EC
GAVRIN, A
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GAVRIN, A
CELOTTA, RJ
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CELOTTA, RJ
机构:
来源:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
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1994年
/
12卷
/
03期
关键词:
D O I:
10.1116/1.587653
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to form a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical means, is focused onto the substrate by dipole forces from the standing wave pattern so as to deposit a series of lines spaced by half the laser wavelength. We describe the fabrication of a Cr nanograting formed using this new technique. The experimental arrangement for deposition and the optical collimation of the atom beam are described. Scanning electron microscopy (SEM) and atomic force microscopy (AFM)images of the resulting nanostructures are presented.