HIGH-TC THIN-FILMS PREPARED BY LASER ABLATION - MATERIAL DISTRIBUTION AND DROPLET PROBLEM

The lateral material distribution of laser-deposited YBa2Cu3O7-delta films and the density of droplets coming from the target were studied by varying the laser pulse energy, the laser spot size and the target-to-substrate distance. Silicon wafers at ambient temperature were used as substrates to guarantee a large sticking coefficient of the particles. The deposition rate is found to depend linearly on the laser energy density E and quadratically on the spot size S at the target, whereas the droplet density is slightly dependent on E and increases linearly with 1/S, yielding a threshold energy of 0.9 J cm-2. With a laser spot size of 7.15 mm2 and a laser energy density of 1.2 J cm-2, we were able to reduce the number of droplets to one to two per 500-mu-m2 for a high quality high T(c) film with a typical thickness of 100 nm.