STRUCTURE AND ELECTRICAL-PROPERTIES OF THE ELECTROFORMED MIM STRUCTURE

被引：14

作者：

THURSTANS, RE

机构：

[1] School of Physics, Leicester Polytechnic, P.O. Box 143

来源：

THIN SOLID FILMS | 1979年 / 57卷 / 01期

关键词：

D O I：

10.1016/0040-6090(79)90421-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Measurements of resistance and differential resistance as a function of voltage over a temperature range 4-300 K were made on electroformed Al/SiOx/Au structures. The results indicate that electron transport is by inter-island tunnelling and that an electroformed structure resembles an ultra-short ultra-thin metal film. © 1979.

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页码：153 / 156

页数：4

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