RF SPUTTERING OF MULTILAYER THIN FILMS

被引:5
作者
HERTE, L
LANG, A
MYERS, DO
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 01期
关键词
D O I
10.1116/1.1492637
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:109 / &
相关论文
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DAVIDSE PD, 1966, J APPL PHYS, V37, P571
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GERSTENBERG D, 1967, NATL VAC S AMERICAN, P10
[3]  
GERSTENBERG D, 1967, NATL VAC S AMERICAN, P9
[4]   SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].
LAEGREID, N ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&
[5]  
MAISSEL LI, 1967, NATL VAC S AMERICAN, P7
[6]  
MAISSEL LI, 1967, NATL VAC S AMERICAN, P8