SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV

被引：716

作者：

LAEGREID, N

WEHNER, GK

机构：

来源：

关键词：

D O I：

10.1063/1.1736012

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：365 / &

共 12 条

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BRADLEY, RC
[J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (01) : 1 - 8
[2] GUENTHERSCHULZE A, 1930, Z PHYS, V62, P607
[3] PRODUCTION AND DEMONSTRATION OF ATOMICALLY CLEAN METAL SURFACES
HAGSTRUM, HD
DAMICO, C
[J]. JOURNAL OF APPLIED PHYSICS, 1960, 31 (04) : 715 - 723
[4] KOENIG H, 1951, Z PHYS, V129, P491
[5] SPUTTERING YIELD OF GERMANIUM IN RARE GASES
LAEGREID, N
WEHNER, G
MECKEL, B
[J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (03) : 374 - 377
[6] MASSEY HSW, 1952, ELECTRONIC IONIC IMP
[7] SCHIEFER K, 1955, DISSERTATION
[8] SPUTTERING THRESHOLDS AND DISPLACEMENT ENERGIES
STUART, RV
WEHNER, GK
[J]. PHYSICAL REVIEW LETTERS, 1960, 4 (08) : 409 - 410
[9] CONTROLLED SPUTTERING OF METALS BY LOW-ENERGY HG IONS
WEHNER, GK
[J]. PHYSICAL REVIEW, 1956, 102 (03): : 690 - 704
[10] LOW-ENERGY SPUTTERING YIELDS IN HG
WEHNER, GK
[J]. PHYSICAL REVIEW, 1958, 112 (04): : 1120 - 1124