PRODUCTION AND DEMONSTRATION OF ATOMICALLY CLEAN METAL SURFACES

被引：69

作者：

HAGSTRUM, HD

DAMICO, C

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1960年 / 31卷 / 04期

关键词：

D O I：

10.1063/1.1735674

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：715 / 723

页数：9

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共 46 条

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[3] ADSORPTION ON METAL SURFACES AND ITS BEARING ON CATALYSIS
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[5] FIELD EMISSION MICROSCOPE AND FLASH FILAMENT TECHNIQUES FOR THE STUDY OF STRUCTURE AND ADSORPTION ON METAL SURFACES
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[6] BECKER JM, COMMUNICATION
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[J]. JOURNAL OF APPLIED PHYSICS, 1957, 28 (02) : 174 - 184
[8] WORK FUNCTION AND SORPTION PROPERTIES OF SILICON CRYSTALS
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[J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (08) : 1195 - 1202
[9] THE INTERACTION OF NITROGEN WITH A TUNGSTEN SURFACE
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[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1956, 60 (10) : 1388 - 1400
[10] PROPERTIES OF HYDROGEN CHEMISORBED ON TUNGSTEN
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[J]. JOURNAL OF CHEMICAL PHYSICS, 1958, 29 (05) : 1154 - 1160

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