SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES

[1] ULTRA-HIGH VACUUM .2. LIMITING FACTORS ON THE ATTAINMENT OF VERY LOW PRESSURE [J]. JOURNAL OF APPLIED PHYSICS, 1954, 25 (02) : 202 - 209

[2] NEW DEVELOPMENTS IN THE PRODUCTION AND MEASUREMENT OF ULTRA HIGH VACUUM [J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (07) : 860 - 876

[3] BRADLEY RC, 1958, 6 CORN U

[4] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY [J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (03) : 549 - 555

[5] INGHRAM MG, 1953, HDB MASS SPECTROSCOP

[6] Killeffer D. H., 1952, MOLYBDENUM COMPOUNDS

[7] MASSEY HSW, 1952, ELECTRONIC IONIC IMP

[8] ADSORPTION OF NICKEL ON MOLYBDENUM IN THE FIELD EMISSION MICROSCOPE [J]. JOURNAL OF CHEMICAL PHYSICS, 1957, 27 (03) : 646 - 652

[9] WEHNER G, COMMUNICATION

[10] Wehner G.K., 1955, ADV ELECTRON EL P, V7, P239

[1] ULTRA-HIGH VACUUM .2. LIMITING FACTORS ON THE ATTAINMENT OF VERY LOW PRESSURE [J]. JOURNAL OF APPLIED PHYSICS, 1954, 25 (02) : 202 - 209

[2] NEW DEVELOPMENTS IN THE PRODUCTION AND MEASUREMENT OF ULTRA HIGH VACUUM [J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (07) : 860 - 876

[3] BRADLEY RC, 1958, 6 CORN U

[4] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY [J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (03) : 549 - 555

[5] INGHRAM MG, 1953, HDB MASS SPECTROSCOP

[6] Killeffer D. H., 1952, MOLYBDENUM COMPOUNDS

[7] MASSEY HSW, 1952, ELECTRONIC IONIC IMP

[8] ADSORPTION OF NICKEL ON MOLYBDENUM IN THE FIELD EMISSION MICROSCOPE [J]. JOURNAL OF CHEMICAL PHYSICS, 1957, 27 (03) : 646 - 652

[9] WEHNER G, COMMUNICATION

[10] Wehner G.K., 1955, ADV ELECTRON EL P, V7, P239