AMORPHOUS SI AND SI-BASED ALLOYS FROM GLOW-DISCHARGE PLASMA

被引：12

作者：

MATSUDA, A

机构：

来源：

PURE AND APPLIED CHEMISTRY | 1988年 / 60卷 / 05期

关键词：

D O I：

10.1351/pac198860050733

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：733 / 740

页数：8

共 16 条

[1] AMORPHOUS SILICON SOLAR-CELL [J].

CARLSON, DE ;

WRONSKI, CR .

APPLIED PHYSICS LETTERS, 1976, 28 (11) :671-673

[2]

DREVILLON B, 1981, 5TH P INT S PLASM CH, P488

[3]

KUSHNER MJ, 1983, J APPL PHYS, V54, P4953

[4] AMORPHOUS-SILICON FIELD-EFFECT DEVICE AND POSSIBLE APPLICATION [J].

LECOMBER, PG ;

SPEAR, WE ;

GHAITH, A .

ELECTRONICS LETTERS, 1979, 15 (06) :179-181

[5]

LONGEWAY PA, 1984, SEMICONDUCTORS SEMIM, V21

[6] PREPARATION OF HIGHLY PHOTOSENSITIVE HYDROGENATED AMORPHOUS SI-C ALLOYS FROM A GLOW-DISCHARGE PLASMA [J].

MATSUDA, A ;

YAMAOKA, T ;

WOLFF, S ;

KOYAMA, M ;

IMANISHI, Y ;

KATAOKA, H ;

MATSUURA, H ;

TANAKA, K .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (11) :4025-4027

[7] GLOW-DISCHARGE DEPOSITION OF A-SI-H FROM PURE SI2H6 AND PURE SIH4 [J].

MATSUDA, A ;

KAGA, T ;

TANAKA, H ;

MALHOTRA, L ;

TANAKA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (02) :L115-L117

[8] FORMATION KINETICS AND CONTROL OF MICROCRYSTALLITE IN MU-C-SI-H FROM GLOW-DISCHARGE PLASMA [J].

MATSUDA, A .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) :767-774

[9] PLASMA SPECTROSCOPY GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON [J].

MATSUDA, A ;

TANAKA, K .

THIN SOLID FILMS, 1982, 92 (1-2) :171-187

[10] INVESTIGATION OF THE GROWTH-KINETICS OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON USING A RADICAL SEPARATION TECHNIQUE [J].

MATSUDA, A ;

TANAKA, K .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (07) :2351-2356

← 1 2 →