MULTIWAVELENGTH INGAAS/INGAASP STRAINED-LAYER MQW-LASER ARRAY USING SHADOW-MASKED GROWTH

被引:7
作者
COUDENYS, G
MOERMAN, I
ZHU, Y
VANDAELE, P
DEMEESTER, P
机构
[1] University of Gent-IMEC, Laboratory of Elec-tromagnetism and Acoustics
关键词
D O I
10.1109/68.141954
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter we present a simple technique for the fabrication of multiwavelength laser arrays. The lateral variations in bandgap (or emission wavelength) between the different lasers are obtained by the use of shadow masked growth. The shadow masked growth results in variations in thickness (and to a lesser extent, in composition) over the substrate. In combination with a multiquantum well (MQW) active region, this gives the required bandgap variations. By varying the window width in the shadow mask between 10-mu-m and >500-mu-m it was possible to obtain a wavelength span of 130 nm centered around 1.55-mu-m. The strained-layer-ridge MQW Fabry-Perot lasers showed a constant threshold current (around 70 mA for a 11-mu-m x 500-mu-m stripe).
引用
收藏
页码:524 / 526
页数:3
相关论文
共 8 条
[1]   NOVEL STRUCTURE MQW ELECTROABSORPTION MODULATOR DFB-LASER INTEGRATED DEVICE FABRICATED BY SELECTIVE AREA MOCVD GROWTH [J].
AOKI, M ;
SANO, H ;
SUZUKI, M ;
TAKAHASHI, M ;
UOMI, K ;
TAKAI, A .
ELECTRONICS LETTERS, 1991, 27 (23) :2138-2140
[2]  
COUDENYS G, 1991, DEC P MRS FALL M BOS
[3]   GROWTH VELOCITY VARIATIONS DURING METALORGANIC VAPOR-PHASE EPITAXY THROUGH AN EPITAXIAL SHADOW MASK [J].
DEMEESTER, P ;
BUYDENS, L ;
VANDAELE, P .
APPLIED PHYSICS LETTERS, 1990, 57 (02) :168-170
[4]   COMPARATIVE-ANALYSIS OF GROWTH-RATE REDUCTIONS ON SHADOW MASKED SUBSTRATES [J].
DEVLAMYNCK, K ;
COUDENYS, G ;
DEMEESTER, P .
APPLIED PHYSICS LETTERS, 1991, 59 (24) :3145-3147
[5]  
KATO T, 1991, 17TH P EUR C OPT COM, P429
[6]   WAVELENGTH DIVISION MULTIPLEXING LIGHT-SOURCE WITH INTEGRATED QUANTUM WELL TUNABLE LASERS AND OPTICAL AMPLIFIERS [J].
KOREN, U ;
KOCH, TL ;
MILLER, BI ;
EISENSTEIN, G ;
BOSWORTH, RH .
APPLIED PHYSICS LETTERS, 1989, 54 (21) :2056-2058
[7]  
OKUDA H, 1987, DEV TECHNOL, V2, P197
[8]  
SAKANO S, 1990, P ECOC 90, P275