DETERMINATION OF RATES FOR ORIENTATION-DEPENDENT ETCHING

被引：25

作者：

ZIELKE, D ^{[1
]}

FRUHAUF, J ^{[1
]}

机构：

[1] TECH UNIV CHEMNITZ,FAK ELEKTROTECH & INFORMAT TECH,D-09107 CHEMNITZ,GERMANY

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1995年 / 48卷 / 02期

关键词：

ETCH RATES; ORIENTATION-DEPENDENT ETCHING;

D O I：

10.1016/0924-4247(95)00993-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

For the simulation of orientation-dependent etching processes it is necessary to determine the etch rates of the etchant used. Two methods will be described for the determination of these etch rates. Special importance will be attached to the use of only familiar technological process steps and materials for the determination.

引用

页码：151 / 156

页数：6

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