ANOMALOUS PHOTOEMISSION UNDER THE INFLUENCE OF A CHARGED SUBSTANCE IN LOW-FREQUENCY PARALLEL-PLATES DISCHARGE IN N2 GAS

被引:1
作者
SUGANOMATA, S
ISHIKAWA, I
TANAKA, J
机构
[1] Yamanashi University, Kofu
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 07期
关键词
ANOMALOUS PHOTOEMISSION; N2 337.1 NM LINE; N2+ 391.4 NM LINE; LOW-FREQUENCY DISCHARGE; N2; GAS; CHARGED WAFER OR FILM;
D O I
10.1143/JJAP.31.2263
中图分类号
O59 [应用物理学];
学科分类号
摘要
Emissions at N2 337.1 and N2+ 391.4 nm lines were observed near a charged-substance-like wafer or film attached to one of two electrodes which was changing from the temporary cathode to the anode under an applied voltage at frequencies from 1 to 20 kHz. The temporal variation of the floating potential was investigated by the relationship of photoemission to the discharge current at pressures from 0.1 to 0.4 Torr.
引用
收藏
页码:2263 / 2264
页数:2
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