SIZE EFFECTS IN EPITAXIAL ALUMINUM FILMS

被引:20
作者
DOBIERZEWSKAMOZRZYMAS, E [1 ]
WARKUSZ, F [1 ]
机构
[1] POLYTECH INST WROCLAW,INST PHYS,PL-50370 WROCLAW,POLAND
关键词
D O I
10.1016/0040-6090(77)90288-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:267 / 273
页数:7
相关论文
共 19 条
[1]   RESISTIVITY DUE TO GRAIN BOUNDARIES IN PURE COPPER [J].
ANDREWS, PV .
PHYSICS LETTERS, 1965, 19 (07) :558-&
[2]  
[Anonymous], [No title captured]
[3]   EFFECT OF GRAIN BOUNDARIES ON ELECTRICAL RESISTIVITY OF HIGH-PURITY IRON AT 4.2 DEGREES K [J].
ARAJS, S ;
OLIVER, BF ;
MICHALAK, JT .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (04) :1676-&
[4]  
BASSEWITH A, 1969, PHYS REV, V183, P182
[5]  
DOBIERZEWSKAMOZ.E, 1975, KOMUNIKAT I FIZ, V301
[6]   CRYSTALLIZATION CONDITIONS OF ALUMINUM EPITAXIAL LAYERS ON SODIUM-CHLORIDE [J].
DOBIERZEWSKAMOZRZYMAS, E ;
OHLY, T ;
WARKUSZ, F .
JOURNAL OF CRYSTAL GROWTH, 1976, 32 (01) :129-132
[7]  
DOBIERZEWSKAMOZRZYMAS E, 1975, ACTA PHYS POL A, VA 47, P93
[8]   The conductivity of thin metallic films according to the electron theory of metals [J].
Fuchs, K .
PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 :100-108
[9]   RESISTIVITY AND STRUCTURE OF EVAPORATED ALUMINUM FILMS [J].
MAYADAS, AF ;
FEDER, R ;
ROSENBERG, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :690-+
[10]   ELECTRICAL-RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS - CASE OF ARBITRARY REFLECTION AT EXTERNAL SURFACES [J].
MAYADAS, AF ;
SHATZKES, M .
PHYSICAL REVIEW B, 1970, 1 (04) :1382-&