ELECTRONIC QUENCHING RATE CONSTANTS FOR XE(P-3(2), AR(P-3(0), AND AR(P-3(2) ATOMS BY FLUORINE-CONTAINING MOLECULES, SIH4, SIH2CL2, SIHCL3, AND SICL4

被引:22
作者
CHEN, XS [1 ]
SETSER, DW [1 ]
机构
[1] KANSAS STATE UNIV AGR & APPL SCI,DEPT CHEM,MANHATTAN,KS 66506
关键词
D O I
10.1021/j100175a015
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The room temperature quenching mte constants for Xe(3P2), Ar(3P2), and Ar(3P0) atoms have been measured for approximately 30 molecules, selected so as to extend results of an earlier study (Velazco; et al. J. Chem. Phys. 1978, 69, 4357) to molecules containing fluorine, as well as a series containing Si. Highly fluorinated molecules have small quenching rate constants, especially with Xe(3P2). The data from the molecules with large thermal quenching cross sections, (sigma(Q)) greater-than-or-equal-to 30 angstrom 2, are combined with previous data to confirm the correlation of the quenching cross sections with parameters related to the long-range interaction potential. The correlation of In sigma(Q)(T) versus In C6 can be used to estimate cross sections that have not been measured. A few reactions with Ar(3P0,2) gave emission from product fragments. In addition to the SiCl2(A1B1-X1A1) transition, an emission from 500 to 600 nm was found from Ar(3P0,2) with SiCl4 and SiHCl3, which is assigned to the SiCl2(a3B1-X1A1) transition.
引用
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页码:8473 / 8482
页数:10
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