PLASMA-ETCHING OF SNO2 FILMS ON SILICON SUBSTRATES

被引:6
作者
BRAGA, ES [1 ]
MAMMANA, AP [1 ]
MAMMANA, CIZ [1 ]
ANDERSON, RL [1 ]
机构
[1] UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405
关键词
D O I
10.1016/0040-6090(80)90483-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:L5 / L6
页数:2
相关论文
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