共 5 条
PLASMA-ETCHING OF SNO2 FILMS ON SILICON SUBSTRATES
被引:6
作者:

BRAGA, ES
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405 UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405

MAMMANA, AP
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405 UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405

MAMMANA, CIZ
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405 UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405

ANDERSON, RL
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h-index: 0
机构:
UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405 UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405
机构:
[1] UNIV VERMONT,DEPT ELECT ENGN,BURLINGTON,VT 05405
关键词:
D O I:
10.1016/0040-6090(80)90483-6
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
引用
收藏
页码:L5 / L6
页数:2
相关论文
共 5 条
[1]
ELECTROCHEMICAL PATTERNING OF TIN OXIDE-FILMS
[J].
BALIGA, BJ
;
GHANDHI, SK
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
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BALIGA, BJ
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机构: GE,CTR CORP RES & DEV,SCHENECTADY,NY 12301

GHANDHI, SK
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机构: GE,CTR CORP RES & DEV,SCHENECTADY,NY 12301
[2]
ETCHING METHODS FOR INDIUM OXIDE-TIN OXIDE-FILMS
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THIN SOLID FILMS,
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BRADSHAW, G
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机构:
ROY RADAR ESTAB,MALVERN WR14 3PS,WORCESTERSHIRE,ENGLAND ROY RADAR ESTAB,MALVERN WR14 3PS,WORCESTERSHIRE,ENGLAND

HUGHES, AJ
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h-index: 0
机构:
ROY RADAR ESTAB,MALVERN WR14 3PS,WORCESTERSHIRE,ENGLAND ROY RADAR ESTAB,MALVERN WR14 3PS,WORCESTERSHIRE,ENGLAND
[3]
STRUCTURE, PHOTO-VOLTAIC PROPERTIES, AND ANGLE-OF-INCIDENCE CORRELATIONS OF ELECTRON-BEAM-DEPOSITED SNO2-IN-SI SOLAR-CELLS
[J].
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FENG, T
论文数: 0 引用数: 0
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机构: Exxon Research and Engineering Company, Linden

GHOSH, AK
论文数: 0 引用数: 0
h-index: 0
机构: Exxon Research and Engineering Company, Linden

FISHMAN, C
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机构: Exxon Research and Engineering Company, Linden
[4]
HETEROJUNCTION SOLAR-CELLS OF SNO 2/SI
[J].
FRANZ, S
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FRANZ, S
论文数: 0 引用数: 0
h-index: 0
机构:
SYRACUSE UNIV,DEPT ELECT & COMP ENGN,PHYS ELECTR LAB,SYRACUSE,NY 13210 SYRACUSE UNIV,DEPT ELECT & COMP ENGN,PHYS ELECTR LAB,SYRACUSE,NY 13210

KENT, G
论文数: 0 引用数: 0
h-index: 0
机构:
SYRACUSE UNIV,DEPT ELECT & COMP ENGN,PHYS ELECTR LAB,SYRACUSE,NY 13210 SYRACUSE UNIV,DEPT ELECT & COMP ENGN,PHYS ELECTR LAB,SYRACUSE,NY 13210

ANDERSON, RL
论文数: 0 引用数: 0
h-index: 0
机构:
SYRACUSE UNIV,DEPT ELECT & COMP ENGN,PHYS ELECTR LAB,SYRACUSE,NY 13210 SYRACUSE UNIV,DEPT ELECT & COMP ENGN,PHYS ELECTR LAB,SYRACUSE,NY 13210
[5]
OPTIMIZATION OF TIN OXIDE THIN-FILM PREPARATION VIA GAS-PHASE TRANSPORT
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MANIFACIER, JC
论文数: 0 引用数: 0
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机构:
UNIV SCI & TECH LANGUEDOC,CNRS,CTR ETUDES ELECTR SOLIDES,MONTPELLIER,FRANCE UNIV SCI & TECH LANGUEDOC,CNRS,CTR ETUDES ELECTR SOLIDES,MONTPELLIER,FRANCE

MURCIA, MD
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h-index: 0
机构:
UNIV SCI & TECH LANGUEDOC,CNRS,CTR ETUDES ELECTR SOLIDES,MONTPELLIER,FRANCE UNIV SCI & TECH LANGUEDOC,CNRS,CTR ETUDES ELECTR SOLIDES,MONTPELLIER,FRANCE

FILLARD, JP
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV SCI & TECH LANGUEDOC,CNRS,CTR ETUDES ELECTR SOLIDES,MONTPELLIER,FRANCE UNIV SCI & TECH LANGUEDOC,CNRS,CTR ETUDES ELECTR SOLIDES,MONTPELLIER,FRANCE