CHARACTERIZATION OF HOMOEPITAXIAL DIAMOND FILMS GROWN FROM CARBON-MONOXIDE

被引:19
作者
MORI, Y
YAGI, H
DEGUCHI, M
SOGI, T
YOKOTA, Y
EIMORI, N
YAGYU, H
OHNISHI, H
KITABATAKE, M
NISHIMURA, K
HATTA, A
ITO, T
HIRAO, T
SASAKI, T
HIRAKI, A
机构
[1] OSAKA GAS CO LTD,FUNDAMENTAL RES LABS,KONOHANA KU,OSAKA 554,JAPAN
[2] OSAKA DIAMOND IND CO LTD,SAKAI,OSAKA 593,JAPAN
[3] MATSUSHITA ELECT IND CO LTD,CENT RES LABS,MORIGUCHI,OSAKA 570,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 10期
关键词
HOMOEPITAXIAL DIAMOND FILM; CARBON MONOXIDE; SEM; AFM; RHEED; HALL MOBILITY; MAGNETORESISTANCE; CATHODOLUMINESCENCE; SUBSTRATE ORIENTATION;
D O I
10.1143/JJAP.32.4661
中图分类号
O59 [应用物理学];
学科分类号
摘要
The crystallinities and electrical properties of homoepitaxial diamond films grown from carbon monoxide have been investigated. The films were grown on high-pressure synthesized diamond (100) and (111) substrates by microwave plasma chemical vapor deposition, and were characterized by means of atomic force microscopy, reflection high-energy electron diffraction, cathodoluminescence, secondary electron microscopy and Hall eff ect measurement. The (100) films were smooth, whereas films grown on the (111) substrate became rough. The boron-doped (100) film also exhibited Hall mobility of 451 cm2/Vs.
引用
收藏
页码:4661 / 4668
页数:8
相关论文
共 22 条
[1]  
BACKMANN PK, 1991, DIAM RELAT MATER, V1, P1
[2]   GROWTH-KINETICS OF (100), (110), AND (111) HOMOEPITAXIAL DIAMOND FILMS [J].
CHU, CJ ;
HAUGE, RH ;
MARGRAVE, JL ;
DEVELYN, MP .
APPLIED PHYSICS LETTERS, 1992, 61 (12) :1393-1395
[3]   THE CHARACTERIZATION OF POINT-DEFECTS IN DIAMOND BY LUMINESCENCE SPECTROSCOPY [J].
COLLINS, AT .
DIAMOND AND RELATED MATERIALS, 1992, 1 (5-6) :457-469
[4]  
Field J.E., 1979, PROPERTIES DIAMOND
[5]   DETAILED SURFACE AND GAS-PHASE CHEMICAL-KINETICS OF DIAMOND DEPOSITION [J].
FRENKLACH, M ;
WANG, H .
PHYSICAL REVIEW B, 1991, 43 (02) :1520-1545
[6]  
FUJIMORI N, 1990, MATER RES SOC SYMP P, V162, P23
[7]  
GEIS MW, 1990, DIAMOND SIC RELATED, V162, P15
[8]   CATHODOLUMINESCENCE FROM EPITAXIAL DIAMOND LAYER GROWN BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION ON HIGH-PRESSURE SYNTHETIC DIAMOND [J].
KATSUMATA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (11) :3594-3597
[9]   CATHODOLUMINESCENCE AND ELECTROLUMINESCENCE OF UNDOPED AND BORON-DOPED DIAMOND FORMED BY PLASMA CHEMICAL VAPOR-DEPOSITION [J].
KAWARADA, H ;
YOKOTA, Y ;
MORI, Y ;
NISHIMURA, K ;
HIRAKI, A .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (02) :983-989
[10]   EPITAXIAL-GROWTH OF DIAMOND THIN-FILMS ON CUBIC BORON NITRIDE(111) SURFACES BY DC PLASMA CHEMICAL VAPOR-DEPOSITION [J].
KOIZUMI, S ;
MURAKAMI, T ;
INUZUKA, T ;
SUZUKI, K .
APPLIED PHYSICS LETTERS, 1990, 57 (06) :563-565