DIFFUSIONAL RELAXATION IN DIMER DEPOSITION

被引：58

作者：

PRIVMAN, V ^{[1
]}

NIELABA, P ^{[1
]}

机构：

[1] UNIV MAINZ, INST PHYS, W-6500 MAINZ, GERMANY

来源：

EUROPHYSICS LETTERS | 1992年 / 18卷 / 08期

关键词：

NONEQUILIBRIUM THERMODYNAMICS; IRREVERSIBLE PROCESSES; KINETICS; (EVAPORATION; ADSORPTION; CONDENSATION; CATALYSIS; ETC); COMPUTATIONAL MODELING;

D O I：

10.1209/0295-5075/18/8/002

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

In deposition of dimers on a 1D lattice substrate, we find by analytical arguments, supported by numerical Monte Carlo simulations, that the effect of added diffusional relaxation is to allow the full, saturation coverage, 100%, for large times. This limiting coverage is approached according to the approximately 1/square-root t power law preceded, for fast diffusion, by the mean-field crossover regime with the intermediate approximately 1/t behavior.

引用

页码：673 / 678

页数：6

共 12 条

[1] KINETICS OF IRREVERSIBLE MONOLAYER AND MULTILAYER ADSORPTION [J].