A STUDY OF THE ELECTRONIC-STRUCTURE AND SCHOTTKY BARRIERS AT RECONSTRUCTED SN SI INTERFACES

被引:3
作者
ANYELE, HT
CAFOLLA, AA
MATTHAI, CC
机构
[1] Department of Physics and Astronomy, UWCC, Cardiff
关键词
D O I
10.1016/0169-4332(93)90555-P
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Self-consistent electronic structure calculations have been performed on the Sn/Si(111) (square-root 3 x square-root 3) and (2 square-root 3 x 2 square-root 3) reconstructed surfaces and the Schottky barrier height deduced. The geometric structure of these surfaces was determined by molecular dynamics simulations with the interaction between atoms being described by a valence force field model. We find that the barrier height at the (square-root 3 x square-root 3) interface is lower than that at the (2 square-root 3 x 2 square-root 3) interface by 0.27 eV. This is in good agreement with experiment.
引用
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页码:433 / 437
页数:5
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