STRAIN VARIATIONS IN HETEROEPITAXIAL INP-ON-SI GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：10

作者：

WUU, DS

HORNG, RH

LEE, MK

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 22期

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D O I：

10.1063/1.101137

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2244 / 2246

页数：3

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