THE DEGRADATION OF FLUORINE DOPED TIN OXIDE-FILMS IN A HYDROGEN PLASMA

被引：17

作者：

MAJOR, S

BHATNAGAR, MC

KUMAR, S

CHOPRA, KL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575565

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2415 / 2420

页数：6

共 9 条

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[7] ANNEALING CHARACTERISTICS OF TIN OXIDE-FILMS PREPARED BY SPRAY PYROLYSIS [J].

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