PHOTOELECTRIC DETECTION OF CHANGES IN THIN INSULATING FILMS CAUSED BY EVAPORATION OF A METAL ELECTRODE

被引：2

作者：

HARTL, M

机构：

[1] Institut für Technische Electronik Technische Hochschule München, Arcisstrasse 21

来源：

SOLID-STATE ELECTRONICS | 1969年 / 12卷 / 12期

关键词：

D O I：

10.1016/0038-1101(69)90024-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

[No abstract available]

引用

页码：1002 / &

共 10 条

[1] TEMPERATURE CHANGES IN THIN METAL FILMS DURING VAPOR DEPOSITION [J].

BELOUS, MV ;

WAYMAN, CM .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) :5119-&

[2] ELECTRON TRANSFER PROCESSES TRHOUGH TANTALUM-TANTALUM-OXIDE DIODES [J].

FLANNERY, WE ;

POLLACK, SR .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (12) :4417-&

[3]

GUPTA CK, 1968, J METALS MAY, P25

[4] HOT ELECTRON ENERGY LOSS IN TUNNEL CATHODE STRUCTURES [J].

HANDY, RM .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (13) :4620-&

[5]

HARTL M, 1967, Z ANGEW PHYSIK, V23, P337

[6]

HARTL M, 1965, Z ANGEW PHYS, V19, P695

[7] ELECTRON TRANSPORT MECHANISMS IN THIN INSULATING FILMS [J].

MEAD, CA .

PHYSICAL REVIEW, 1962, 128 (05) :2088-&

[8]

SOSHEA RW, 1965, PHYS REV, V138, P1182

[9] SOME OBSERVATIONS ON CONDUCTION THROUGH THIN TANTALUM OXIDE FILMS [J].

STANDLEY, CL ;

MAISSEL, LI .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (05) :1530-&

[10] CONDUCTION AND RECTIFICATION IN ANODIC OXIDE FILMS [J].

VERMILYE.DA .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (11) :3663-&

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