PLASMA X-RAY SOURCE FOR LITHOGRAPHY GENERATED BY A-ALMOST-EQUAL-TO-30 J, 30 NS KRF LASER

被引:18
作者
DAVIS, GM
GOWER, MC
ONEILL, F
TURCU, ICE
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D O I
10.1063/1.99919
中图分类号
O59 [应用物理学];
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页码:1583 / 1585
页数:3
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