BAND OFFSETS AND INTERFACIAL PROPERTIES OF CUBIC CDS GROWN BY MOLECULAR-BEAM EPITAXY ON CDTE(110)

被引:51
作者
NILES, DW
HOCHST, H
机构
[1] UNIV WISCONSIN,CTR SYNCHROTRON RADIAT,3731 SCHNEIDER DR,STOUGHTON,WI 53589
[2] MAX PLANCK INST FESTKORPERFORSCH,W-7000 STUTTGART 80,GERMANY
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 18期
关键词
D O I
10.1103/PhysRevB.41.12710
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on the molecular-beam-epitaxy growth of CdS films on CdTe(110), studied with reflection high-energy electron diffraction (RHEED) and angle-resolved photoemission spectroscopy. The exponential attenuation of the Te 4d core-level emission as a function of the CdS film thickness and the persistency of the substratelike RHEED pattern demonstrate that CdS films grow epitaxially in the zinc-blende structure rather than the thermodynamically more favorable hexagonal crystal structure. Core-level intensity and line-shape analysis show that the interface is atomically abrupt and nonreactive. From valence-band photoemission spectra, we find that, compared with CdTe, the CdS 8 valence-band maximum is lower by VB=0.65 eV. Taking the known band gap of cubic CdS (2.42 eV) lets us estimate the 6 conduction-band minimum of CdS to be above that of CdTe by CB=0.21 eV. Our theoretical estimates based on dielectric midgap tight-binding calculations, including the hydrostatic contribution of the 11% tensile lattice strain in the cubic CdS epilayer, predict a much larger valence-band offset of EVB=1.19 eV. © 1990 The American Physical Society.
引用
收藏
页码:12710 / 12719
页数:10
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