POSITIVE-ION CURRENT TO A SPHERICAL ELECTRODE IN A NEGATIVE-ION PLASMA

被引：6

作者：

AMIN, A ^{[1
]}

KIM, HS ^{[1
]}

YI, SJ ^{[1
]}

COONEY, JL ^{[1
]}

LONNGREN, KE ^{[1
]}

机构：

[1] UNIV IOWA,DEPT PHYS & ASTRON,IOWA CITY,IA 52242

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 09期

关键词：

D O I：

10.1063/1.355986

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Critical parameters for the development of the plasma-source ion implantation process are the ion implantation current and the sheath expansion characteristics. Recently, Xia and Chan [J. Appl. Phys. 73, 3651 (1993)] have investigated these parameters for small spherical electrodes inserted in a two component positive ion-electron plasma. This investigation is extended to a plasma that consists of three components: positive ions, negative ions, and electrons.

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收藏

页码：4427 / 4431

页数：5

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