LASER APPLICATION IN HIGH-TEMPERATURE MATERIALS

被引：11

作者：

OHSE, RW ^{[1
]}

机构：

[1] EUROPEAN INST TRANSURANIUM ELEMENTS,KARLSRUHE ESTAB,JOINT RES CTR,COMM EUROPEAN COMMUNITIES,D-7500 KARLSRUHE,FED REP GER

来源：

关键词：

D O I：

10.1351/pac198860030309

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：309 / 322

页数：14

共 90 条

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OSGOOD, R .

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[2]

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[3]

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[4]

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[5]

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[6]

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[7]

BEHNISCH H, 1985, LASER OPTOELEKTRONIK, V4, P385

[8]

Belforte D. B., 1986, IND LASER ANN HDB

[9]

Bober M., 1975, THERMODYNAMICS NUCLE, VI, P295

[10] LASER ANNEALING FOR SEMICONDUCTOR-DEVICES [J].

BOYD, IW ;

WILSON, JIB .