POLY(TERT-BOC-STYRENE SULFONE)-BASED CHEMICALLY AMPLIFIED RESISTS FOR DEEP-UV LITHOGRAPHY

被引：46

作者：

TARASCON, RG

REICHMANIS, E

HOULIHAN, FM

SHUGARD, A

THOMPSON, LF

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 13期

关键词：

D O I：

10.1002/pen.760291304

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：850 / 855

页数：6

共 13 条

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