POLYVINYL ARENE SULFONES) AS NOVEL POSITIVE PHOTORESISTS

被引：28

作者：

BOWDEN, MJ ^{[1
]}

CHANDROSS, EA ^{[1
]}

机构：

[1] BELL TEL LABS,MURRAY HILL,NJ 07974

来源：

关键词：

D O I：

10.1149/1.2134019

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1370 / 1374

页数：5

共 6 条

[1] Bowden M. J., 1975, J POLYM SCI POLYM S, V49, P221
[2] ELECTRON-IRRADIATION OF POLY(OLEFIN SULFONES) - APPLICATION TO ELECTRON-BEAM RESISTS
BOWDEN, MJ
THOMPSON, LF
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1973, 17 (10) : 3211 - 3221
[3] PHOTOLYTIC DECOMPOSITION OF SOME SULFONES BY INTERNALLY SENSITIZED PATH
CAVA, MP
SCHLESSINGER, RH
VANMETER, JP
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1964, 86 (15) : 3173 - &
[4] HTOO MS, 1968, PHOTOGR SCI ENG, V12, P169
[5] Ivin KJ, 1968, ADV MACROMOL CHEM, V1, P335
[6] LAMOLA AA, 1969, ENERGY TRANSFER ORGA, P371