STRUCTURE AND PROPERTIES OF MAGNETRON-SPUTTERED TI-V-N COATINGS

被引：33

作者：

KNOTEK, O ^{[1
]}

BARIMANI, A ^{[1
]}

BOSSERHOFF, B ^{[1
]}

LOFFLER, F ^{[1
]}

机构：

[1] RHEIN WESTFAL TH AACHEN,INST WERKSTOFFKUNDE,W-5100 AACHEN,GERMANY

来源：

THIN SOLID FILMS | 1990年 / 193卷 / 1-2期

关键词：

D O I：

10.1016/S0040-6090(05)80065-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Earlier investigations of ternary and quaternary Ti-Al-N, Ti-Zr-N and Ti-Al-V-N thin films demonstrate the superiority of complex innovative coatings such as (Ti,V)N. Thin coatings in the Ti-V-N system are deposited by reactive magnetron sputtering. The coating composition is modified simply by altering the target composition and the process parameters (partial nitrogen pressure, substrate temperature and substrate bias). The structure and properties of the coatings are investigated using X-ray diffraction, microstructural and energy-dispersive X-ray analysis and metallo-graphic techniques. Wear tests on coated tools additionally show the effect of the alloying vanadium on the wear resistance of the coatings. Thin coatings in the Ti-V-N system were shown to have good hardness values (a maximum Vickers hardness of 3600 HV 0.05) and high critical loads of up to 100 N. The wear test results show the best wear resistance for the coatings at 29 at.%V.

引用

页码：557 / 564

页数：8

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